Label-free sensitivity of long-period gratings enhanced by atomic layer deposited TiO_2 nano-overlays

Capability for Fine Tuning of the Refractive Index Sensing Properties of Long-Period Gratings by Atomic Layer Deposited Al2O3 Overlays

This work presents an application of thin aluminum oxide (Al2O3) films obtained using atomic layer deposition (ALD) for fine tuning the spectral response and refractive-index (RI) sensitivity of long-period gratings (LPGs) induced in optical fibers. The technique allows for an efficient and well controlled deposition at monolayer level (resolution ~ 0.12 nm) of excellent quality nano-films as r...

Long Period Fibre Gratings

Passivation of GaAs surface by atomic-layer-deposited titanium nitride

The suitability of titaniumnitride (TiN) for GaAs surface passivation and protection is investigated. A 2–6nm thick TiN passivation layer is deposited by atomic layer deposition (ALD) at 275 C on top of InGaAs/ GaAs near surface quantum well (NSQW) structures to study the surface passivation. X-ray reflectivity measurements are used to determine the physical properties of the passivation layer....

Grain boundary structures of atomic layer deposited

Grain boundary plays an important role in determining the physical properties and chemical stability of the materials. In particular, the structures of grain boundaries in atomic layer deposited TiN film may be one of the main factors to dominate the reliability and performance of ULSI devices with multilayer structure of Cu-based interconnects. In this work, the characteristics of grain bounda...

Atomic layer deposited high-k nanolaminate capacitors

Al2O3–Ta2O5 nanolaminate films were prepared via atomic layer deposition (ALD) on silicon with a single overall composition and thickness, but with a varying number of Al2O3/Ta2O5 bilayers. The composition of the films was roughly 57% Al2O3 and 43% Ta2O5 and the total film thickness was held at 58 nm, while the number of bilayers was varied from 3 to 192 by changing the target bilayer thickness...